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6. Lancaster, J.R.
"Looking back on Lindau"
Nature Chem., 2009, 1, 587. doi
5. Gu, X; Berro, A.J.; Cho, Y.; Jen, K.; Lee, S.; Nagai, T.; Ogata, T.; Durand, W.J.; Sundaresan, A.; Lancaster, J.R.; Jockusch, S.; Zimmerman, P.; Turro, N.J.; and Willson, C.G.
"Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography"
Proc. of the SPIE, 2009, 7273, 72731C. doi
4. O'Connor, N.; Berro, A.; Lancaster, J.R.; Gu, X.; Jockusch, S.; Nagai, T.; Ogawa, T.; Lee, S.; Zimmerman, P.; Willson, C.G.; and Turro, N.J.
"Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography"
Chem. Mater., 2008, 20, 7374. doi
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