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"Fundamental Study of Optical Threshold Layer Approach Towards Double Exposure Lithography"
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4. O'Connor, N.; Berro, A.; Lancaster, J.R.; Gu, X.; Jockusch, S.; Nagai, T.; Ogawa, T.; Lee, S.; Zimmerman, P.; Willson, C.G.; and Turro, N.J.
"Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography"
Chem. Mater., 2008,
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3. Lancaster, J.R.; Márti, A.A.; López-Gejo, J.; Jockusch, S.; O'Connor, N.; and Turro, N.J.
"Non-radiative deactivation of singlet oxygen (1O2) by cubane and its derivatives"
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2. Lancaster, J.R.; Jahani, J.; Carroll, G.T.; Chen, Y.; Turro, N.J.; and Koberstein, J.T.
"Towards a Universal Method to Pattern Metals on a Polymer"
Chem. Mater., 2008,
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1. Ray, S.A.; McCoy, A.B.; Glennon, J.J.; Darr, J.P.; Fesser, E.J.; Lancaster, J.R.; and Loomis, R.A.
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